DocumentCode :
2661537
Title :
Fabrication and Characterization of Two-Dimensional Photonic Crystal on Silicon by Efficient Methods
Author :
Xingsheng Xu ; Chunxia Wang ; Fang Li ; Guiguang Xiong ; Yuliang Liu ; Hongda Chen
Author_Institution :
State Key Lab. Integrated Optoelectron., Chinese Acad. of Sci., Beijing
fYear :
2006
fDate :
13-15 Sept. 2006
Firstpage :
69
Lastpage :
71
Abstract :
Two-dimensional photonic crystals working in near infrared region are fabricated into silicon-on-insulator wafer by 248-nm deep UV lithography. We present an efficient way to measure the photonic crystal waveguide´s light transmission spectra at given polarization states
Keywords :
integrated optics; light polarisation; light transmission; optical fabrication; optical materials; optical testing; optical waveguides; photonic crystals; silicon-on-insulator; ultraviolet lithography; 248 nm; Si-SiO2; deep UV lithography; light transmission spectra; polarization states; silicon-on-insulator wafer; two-dimensional photonic crystal waveguide characterization; two-dimensional photonic crystal waveguide fabrication; Etching; Lithography; Optical device fabrication; Optical fiber polarization; Optical polarization; Optical refraction; Optical scattering; Optical waveguides; Photonic crystals; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Group IV Photonics, 2006. 3rd IEEE International Conference on
Conference_Location :
Ottawa, Ont.
Print_ISBN :
1-4244-0096-1
Type :
conf
DOI :
10.1109/GROUP4.2006.1708168
Filename :
1708168
Link To Document :
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