DocumentCode
2661546
Title
Vertically-Stacked SOI Waveguides for 3-D Photonic Circuits
Author
Brooks, C.J. ; Doylend, J.K. ; Knights, A.P. ; Jessop, P.E.
Author_Institution
Dept. of Eng. Phys., McMaster Univ., Hamilton, Ont.
fYear
2006
fDate
13-15 Sept. 2006
Firstpage
72
Lastpage
74
Abstract
We present a fabrication process for vertically-stacked SOI waveguides using spin-on-glass bonding to process individual layers. Simulations have shown that complete power transfer between 5 mum thick waveguides requires a 1.4 mm coupling length
Keywords
integrated circuit bonding; integrated optics; integrated optoelectronics; optical fabrication; optical waveguides; silicon-on-insulator; 1.4 mm; 3-D photonic circuits; 5 micron; Si-SiO2; coupling length; fabrication process; power transfer; spin-on-glass bonding; vertically-stacked SOI waveguides; Coupling circuits; Etching; Geometrical optics; Optical coupling; Optical device fabrication; Optical waveguides; Semiconductor waveguides; Silicon; Slabs; Wafer bonding;
fLanguage
English
Publisher
ieee
Conference_Titel
Group IV Photonics, 2006. 3rd IEEE International Conference on
Conference_Location
Ottawa, Ont.
Print_ISBN
1-4244-0096-1
Type
conf
DOI
10.1109/GROUP4.2006.1708169
Filename
1708169
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