DocumentCode
2661696
Title
A carbon nanotube capacitor structure
Author
Wood, J.D. ; Budnik, M.M.
Author_Institution
Valparaiso Univ., Valparaiso
fYear
2007
fDate
12-14 Dec. 2007
Firstpage
1
Lastpage
2
Abstract
In this abstract, we present additional details on a new capacitor, CNCAP (carbon nanotube capacitor), compare it to existing integrated circuit capacitor technologies, and address its manufacturability. Properties of metallic, single wall CNTs (large surface area and relatively low resistance) allow for the creation of a very high density capacitor structure. In the CNCAP, each CNT electrode is surrounded by four CNTs connected to the opposing electrode. This structure allows for a potential capacitance/area greater than 100 fF/mum2. The electrical model of two parallel metallic, single wall, CNTs. The principle scattering mechanism in a CNT is due to acoustic phonons (under low bias) and the ideal CNT resistance is based on its length R = (h/4e2)(1+L/lambdaacc) where lambdaacc is the mean free path. The inductance, L, of the CNTs is taken as 4.07 nH/mum, which corresponds to the kinetic inductance. The quantum capacitance per unit length (CQ) of the CNTs is 388 aF/mum.
Keywords
capacitors; carbon nanotubes; phonons; CNCAP; acoustic phonon; carbon nanotube capacitor structure; quantum capacitance; scattering mechanism; single wall CNT electrode; Acoustic scattering; Capacitance; Capacitors; Carbon nanotubes; Electric resistance; Electrodes; Inductance; Integrated circuit manufacture; Integrated circuit technology; Surface resistance;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Device Research Symposium, 2007 International
Conference_Location
College Park, MD
Print_ISBN
978-1-4244-1892-3
Electronic_ISBN
978-1-4244-1892-3
Type
conf
DOI
10.1109/ISDRS.2007.4422543
Filename
4422543
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