DocumentCode
2661773
Title
SiOx/Si Interfacial Si Nano-Pyramids Enhancd Electroluminescence from Si-Rich SiOx MOSLED
Author
Gong-Ru Lin ; Chi-Kuan Lin
Author_Institution
Graduate Inst. of Electro-Opt. Eng., Nat. Taiwan Univ., Taipei
fYear
2006
fDate
13-15 Sept. 2006
Firstpage
107
Lastpage
109
Abstract
Interfacial (100)-oriented Si nanopyramids are synthesized with surface density of 109 cm-2 prior to the growth of Si-rich SiOx, which greatly suppresses blue-green EL and improve near-infrared EL at 30 nW with lifetime of >10 hrs
Keywords
electroluminescence; elemental semiconductors; interface phenomena; light emitting diodes; nanostructured materials; nanotechnology; semiconductor growth; semiconductor thin films; semiconductor-insulator boundaries; silicon; silicon compounds; 30 nW; MOSLED growth; SiOx-Si; interfacial nanopyramids; near-infrared electroluminescence; surface density; Annealing; Diodes; Electroluminescence; Indium tin oxide; Lattices; Nanocrystals; Plasma temperature; Semiconductor films; Silicon; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Group IV Photonics, 2006. 3rd IEEE International Conference on
Conference_Location
Ottawa, Ont.
Print_ISBN
1-4244-0096-1
Type
conf
DOI
10.1109/GROUP4.2006.1708181
Filename
1708181
Link To Document