Title :
2 kV 4H-SiC DMOSFETs for low loss, high frequency switching applications
Author :
Ryu, Sei-Hyung ; Krishnaswami, Sumi ; Das, Mrinal ; Richmond, James ; Agarwal, Anant ; Palmour, John ; Scofield, James
Author_Institution :
Cree, Inc., Durham, NC, USA
Abstract :
Due to the high critical field in 4H-SiC, the drain charge and switching loss densities in a SiC power device are approximately 10× higher than that of a silicon device. However, for the same voltage and resistance ratings, the device area is much smaller for the 4H-SiC device. Therefore, the total drain charge and switching losses are much lower for the 4H-SiC power device. A 2.3 kV, 13.5 mΩ-cm2 4H-SiC power DMOSFET with a device area of 2.1 mm × 2.1 mm has been demonstrated. The device showed a stable avalanche at a drain bias of 2.3 kV, and an on-current of 5 A with a VGS of 20 V and a VDS of 2.6 V. Approximately an order of magnitude lower parasitic capacitance values, as compared to those of commercially available silicon power MOSFETs, were measured for the 4H-SiC power DMOSFET. This suggests that the 4H-SiC DMOSFET can provide an order of magnitude improvement in switching performance in high speed switching applications.
Keywords :
power MOSFET; silicon compounds; wide band gap semiconductors; 2 kV; 2.1 mm; 2.3 kV; 2.6 V; 20 V; 5 A; DMOSFET; SiC; drain charge; high frequency switching applications; parasitic capacitance values; power device; resistance ratings; switching loss densities; voltage ratings; Capacitance measurement; Frequency; Laboratories; MOSFETs; Parasitic capacitance; Silicon carbide; Silicon devices; Switches; Switching loss; Voltage;
Conference_Titel :
High Performance Devices, 2004. Proceedings. IEEE Lester Eastman Conference on
Print_ISBN :
981-256-196-X
DOI :
10.1109/LECHPD.2004.1549703