DocumentCode
2662335
Title
Visible Lasing on Si using Rare Earth Doped GaN
Author
Steckl, A.J. ; Park, J.H.
Author_Institution
Nanoelectron. Lab., Cincinnati Univ., OH
fYear
2006
fDate
13-15 Sept. 2006
Firstpage
209
Lastpage
210
Abstract
Our approach is to achieve a versatile Si-based laser system using rare earth doped GaN grown on Si substrates. The current understanding of rare earth lasing sites in GaN, the intimate relationship between materials growth, properties and resulting laser performance. The success of this approach will result in the availability of laser light sources directly built on Si substrates and operating at wavelengths throughout the visible and near-IR range. The prospects and challenges for electrically pumped injection GaN:RE lasers are considered along with potential applications
Keywords
elemental semiconductors; gallium compounds; laser beams; optical pumping; rare earth metals; semiconductor lasers; silicon; Si; Si-based laser system; electrically pumped injection GaN:RE lasers; laser light source; laser performance; materials growth; rare earth doped GaN; rare earth lasing sites; Erbium; Gallium nitride; Laser excitation; Nanoelectronics; Optical films; Optical materials; Optical pumping; Pump lasers; Substrates; Wide band gap semiconductors;
fLanguage
English
Publisher
ieee
Conference_Titel
Group IV Photonics, 2006. 3rd IEEE International Conference on
Conference_Location
Ottawa, Ont.
Print_ISBN
1-4244-0096-1
Type
conf
DOI
10.1109/GROUP4.2006.1708215
Filename
1708215
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