• DocumentCode
    2662335
  • Title

    Visible Lasing on Si using Rare Earth Doped GaN

  • Author

    Steckl, A.J. ; Park, J.H.

  • Author_Institution
    Nanoelectron. Lab., Cincinnati Univ., OH
  • fYear
    2006
  • fDate
    13-15 Sept. 2006
  • Firstpage
    209
  • Lastpage
    210
  • Abstract
    Our approach is to achieve a versatile Si-based laser system using rare earth doped GaN grown on Si substrates. The current understanding of rare earth lasing sites in GaN, the intimate relationship between materials growth, properties and resulting laser performance. The success of this approach will result in the availability of laser light sources directly built on Si substrates and operating at wavelengths throughout the visible and near-IR range. The prospects and challenges for electrically pumped injection GaN:RE lasers are considered along with potential applications
  • Keywords
    elemental semiconductors; gallium compounds; laser beams; optical pumping; rare earth metals; semiconductor lasers; silicon; Si; Si-based laser system; electrically pumped injection GaN:RE lasers; laser light source; laser performance; materials growth; rare earth doped GaN; rare earth lasing sites; Erbium; Gallium nitride; Laser excitation; Nanoelectronics; Optical films; Optical materials; Optical pumping; Pump lasers; Substrates; Wide band gap semiconductors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Group IV Photonics, 2006. 3rd IEEE International Conference on
  • Conference_Location
    Ottawa, Ont.
  • Print_ISBN
    1-4244-0096-1
  • Type

    conf

  • DOI
    10.1109/GROUP4.2006.1708215
  • Filename
    1708215