Title :
XY-Stage for Scanning Media for Optical Data Storage
Author :
Sasaki, Minoru ; Bono, Fuminori ; Hane, Kazuhiro
Author_Institution :
Dept. of Nanomech., Tohoku Univ., Sendai
Abstract :
XY-stage driven by the electrostatic comb-drive actuator is fabricated realizing long displacement. The actuator is fabricated in one layer of silicon-on-insulator (SOI) wafer, and the media plate is in the other layer. The raster scanning of the plate is realized maintaining orthogonal xy-directions. The fast scanning is y-axis. Two 820times950 mum2-size media plates are driven at the opposite y directions canceling the inertia force. The static maximum displacements are 110 mum (geometrical limit) along x-axis and 90 mum along y-axis. At the resonance, 115 mum (geometrical limit) is obtained along y-axis
Keywords :
electrostatic actuators; micro-optomechanical devices; optical fabrication; optical storage; silicon-on-insulator; 110 micron; 115 micron; 820 micron; 90 micron; 950 micron; SOI; Si-SiO2; actuator fabrication; electrostatic comb-drive actuator; geometrical limit; micro XY-stage; optical data storage; raster plate scanning; silicon-on-insulator wafer; static displacements; Electrostatic actuators; Etching; Memory; Micromechanical devices; Optical arrays; Optical device fabrication; Probes; Resonance; Springs; Voltage;
Conference_Titel :
Optical MEMS and Their Applications Conference, 2006. IEEE/LEOS International Conference on
Conference_Location :
Big Sky, MT
Print_ISBN :
0-7803-9562-X
DOI :
10.1109/OMEMS.2006.1708252
