XY-Stage for Scanning Media for Optical Data Storage

Author

Sasaki, Minoru ; Bono, Fuminori ; Hane, Kazuhiro

Author_Institution

Dept. of Nanomech., Tohoku Univ., Sendai

fYear

2006

fDate

21-24 Aug. 2006

Firstpage

36

Lastpage

37

Abstract

XY-stage driven by the electrostatic comb-drive actuator is fabricated realizing long displacement. The actuator is fabricated in one layer of silicon-on-insulator (SOI) wafer, and the media plate is in the other layer. The raster scanning of the plate is realized maintaining orthogonal xy-directions. The fast scanning is y-axis. Two 820times950 mum²-size media plates are driven at the opposite y directions canceling the inertia force. The static maximum displacements are 110 mum (geometrical limit) along x-axis and 90 mum along y-axis. At the resonance, 115 mum (geometrical limit) is obtained along y-axis

Keywords

electrostatic actuators; micro-optomechanical devices; optical fabrication; optical storage; silicon-on-insulator; 110 micron; 115 micron; 820 micron; 90 micron; 950 micron; SOI; Si-SiO₂; actuator fabrication; electrostatic comb-drive actuator; geometrical limit; micro XY-stage; optical data storage; raster plate scanning; silicon-on-insulator wafer; static displacements; Electrostatic actuators; Etching; Memory; Micromechanical devices; Optical arrays; Optical device fabrication; Probes; Resonance; Springs; Voltage;

fLanguage

English

Publisher

ieee

Conference_Titel

Optical MEMS and Their Applications Conference, 2006. IEEE/LEOS International Conference on

Conference_Location

Big Sky, MT

Print_ISBN

0-7803-9562-X

Type

conf

DOI

10.1109/OMEMS.2006.1708252

Filename

1708252