Title :
Design and Fabrication of a MEMS X-ray Optic using Anisotropic Wet Etching of Si Wafers
Author :
Koshiishi, M. ; Ezoe, Y. ; Mita, M. ; Mitsuda, K. ; Takano, T. ; Maeda, R. ; Ishisaki, Y.
Author_Institution :
Inst. of Space & Astronaut. Sci., Japan Aerosp. Exploration Agency, Kanagawa
Abstract :
In this paper, we report on the development of X-ray optics using anisotropic wet etching of silicon wafers. Both X-ray mirrors and an optics mount are fabricated fully using the MEMS technologies
Keywords :
X-ray optics; elemental semiconductors; etching; micro-optomechanical devices; micromirrors; optical design techniques; optical fabrication; silicon; MEMS X-ray optics design; MEMS X-ray optics fabrication; Si; X-ray mirrors; anisotropic wet etching; optics mount; silicon wafers; Anisotropic magnetoresistance; Geometrical optics; Micromechanical devices; Mirrors; Optical design; Optical device fabrication; Optical devices; Silicon; Wet etching;
Conference_Titel :
Optical MEMS and Their Applications Conference, 2006. IEEE/LEOS International Conference on
Conference_Location :
Big Sky, MT
Print_ISBN :
0-7803-9562-X
DOI :
10.1109/OMEMS.2006.1708276
