DocumentCode :
2665356
Title :
Packaging technology for high-speed multichip module using copper-polyimide thin film multilayer substrate [for B-ISDN]
Author :
Yamaguchi, Satoru ; Ohno, Yukiharu ; Tomimuro, Hisashi
Author_Institution :
NTT Interdisciplinary Res. Lab., Musashino-shi, Tokyo, Japan
fYear :
1993
fDate :
4-6 Oct 1993
Firstpage :
406
Lastpage :
410
Abstract :
The authors describe a multichip module (MCM) having a copper-polyimide thin-film multilayer substrate that overcomes the problems of increased transmission loss at high frequencies maintaining crosstalk noise low, and the increased simultaneous switching noise with a larger number of LSI chips. The conductors are designed to be 10-μm thick and 25-μm wide to enable the transmission of high speed pulses at several Gb/s without decreasing the interconnection density while maintaining crosstalk noise as low as -30 dB. The dielectric thickness between the power and ground layers making up the current loop in the ceramic substrate is designed to be 50μm, which gives rise to a low effective inductance
Keywords :
B-ISDN; copper; crosstalk; multichip modules; polymer films; space division multiplexing; telecommunication switching; -30 dB; 10 micron; 25 micron; 50 micron; Cu; Cu/polyimide; crosstalk noise; dielectric thickness; high-speed multichip module; increased simultaneous switching noise; low effective inductance; packaging technology; thin film multilayer substrate; transmission loss; Conductors; Crosstalk; Dielectric substrates; Frequency; Large scale integration; Multichip modules; Nonhomogeneous media; Packaging; Propagation losses; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Manufacturing Technology Symposium, 1993, Fifteenth IEEE/CHMT International
Conference_Location :
Santa Clara, CA
Print_ISBN :
0-7803-1424-7
Type :
conf
DOI :
10.1109/IEMT.1993.398174
Filename :
398174
Link To Document :
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