DocumentCode
2665427
Title
High density interconnects for rapid prototyping of electronic systems
Author
Lee, Rex A. ; Moreno, Wilfrido A. ; Radomski, Aaron ; Saini, Nitin ; Whittaker, Dennis
Author_Institution
Center for Microelectron. Res., Univ. of South Florida, FL, USA
fYear
1993
fDate
4-6 Oct 1993
Firstpage
381
Lastpage
389
Abstract
High density interconnect technologies for advanced electronic systems are discussed. Primary focus is in the area of laser-created interconnects for quick turnaround prototyping of electronic circuits fabricated using standard very large scale integration (VLSI) process techniques. The laser restructuring of a specific application circuitry at the wafer or packaged chip level is accomplished by creating low electrical resistance links between conductors and cutting conductor lines using an integrated computer-controlled laser system. The restructuring of generic electronic circuits is an excellent technique for alternative low cost, quick turnaround with complete circuit similarity between the laser restructured prototype and the customized product for mass production
Keywords
application specific integrated circuits; integrated circuit interconnections; integrated circuit yield; laser beam machining; process control; wafer-scale integration; ASIC; VLSI; conductor lines; customized product; cutting; high density interconnects; integrated computer-controlled laser system; laser diffused links; laser restructuring; laser-created interconnects; low electrical resistance links; packaged chip level; process development; quick turnaround prototyping; rapid prototyping; specific application circuitry; stand alone interconnect controller; wafer level; wafer probing; Application software; Conductors; Costs; Electric resistance; Electronic circuits; Electronics packaging; Integrated circuit interconnections; Laser beam cutting; Prototypes; Very large scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Manufacturing Technology Symposium, 1993, Fifteenth IEEE/CHMT International
Conference_Location
Santa Clara, CA
Print_ISBN
0-7803-1424-7
Type
conf
DOI
10.1109/IEMT.1993.398178
Filename
398178
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