• DocumentCode
    2665729
  • Title

    Optimizing the wafer dicing process

  • Author

    Efrat, Udi

  • fYear
    1993
  • fDate
    4-6 Oct 1993
  • Firstpage
    245
  • Lastpage
    253
  • Abstract
    Wafer dicing is one of the critical elements of the IC assembly process where improvements can make a major contribution to yield. Chipping (damage along the cut line inherent to the wafer dicing operation) has been identified by semiconductor manufacturers as a relevant area for improvement. A study of process factors that affect the magnitude of the chipping phenomenon is described. The goal is to explore the limits of the current equipment. Cursory experiments are conducted to zero-in on significant factors. During this phase, several factors that were considered major causes for chipping, are found to have no significant effect. A set of designed experiments is run. It identifies chipping sensitivity to process parameters and points at an operating window that improves cut quality. Field tests in production environment confirm the experimental results
  • Keywords
    Blades; Cleaning; Costs; Crystalline materials; Electronics industry; Electrostatic discharge; Semiconductor device manufacture; Semiconductor device measurement; Silicon; Water pollution;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Manufacturing Technology Symposium, 1993, Fifteenth IEEE/CHMT International
  • Conference_Location
    Santa Clara, CA
  • Print_ISBN
    0-7803-1424-7
  • Type

    conf

  • DOI
    10.1109/IEMT.1993.398195
  • Filename
    398195