DocumentCode
2665729
Title
Optimizing the wafer dicing process
Author
Efrat, Udi
fYear
1993
fDate
4-6 Oct 1993
Firstpage
245
Lastpage
253
Abstract
Wafer dicing is one of the critical elements of the IC assembly process where improvements can make a major contribution to yield. Chipping (damage along the cut line inherent to the wafer dicing operation) has been identified by semiconductor manufacturers as a relevant area for improvement. A study of process factors that affect the magnitude of the chipping phenomenon is described. The goal is to explore the limits of the current equipment. Cursory experiments are conducted to zero-in on significant factors. During this phase, several factors that were considered major causes for chipping, are found to have no significant effect. A set of designed experiments is run. It identifies chipping sensitivity to process parameters and points at an operating window that improves cut quality. Field tests in production environment confirm the experimental results
Keywords
Blades; Cleaning; Costs; Crystalline materials; Electronics industry; Electrostatic discharge; Semiconductor device manufacture; Semiconductor device measurement; Silicon; Water pollution;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Manufacturing Technology Symposium, 1993, Fifteenth IEEE/CHMT International
Conference_Location
Santa Clara, CA
Print_ISBN
0-7803-1424-7
Type
conf
DOI
10.1109/IEMT.1993.398195
Filename
398195
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