• DocumentCode
    2666625
  • Title

    Performance Index Evaluations of a Micro Axial-flux Switched-reluctance Motor

  • Author

    Liu, Cheng-Tsung ; Chen, Yen-Ming ; Pang, Da-Chen

  • Author_Institution
    Dept. of Electr. Eng., Nat. Sun Yat-Sen Univ., Kaohsiung
  • Volume
    3
  • fYear
    2006
  • fDate
    14-16 Aug. 2006
  • Firstpage
    1
  • Lastpage
    5
  • Abstract
    For supplying adequate driven force with high operational precision in semiconductor manufacturing industry, construction of a low cost device that can be integrated with the micro-electromechanical system (MEMS) fabrication scheme has been investigated. With both the degraded material property after electroplating process and the geometric constraints of MEMS constructions being considered, magnetic characteristics of a micro axial-flux switched-reluctance motor (muAFSRM) will be carefully analyzed by both analytical modeling and three-dimensional finite element analysis. Supported by a laboratory prototype, the generated torques and attract forces at different pole gaps and overlapped areas of the motor can be evaluated to provide thorough performance indices for relative micro-machine designs and operations
  • Keywords
    electroplating; finite element analysis; magnetic flux; micromachining; micromechanical devices; performance index; reluctance motors; MEMS fabrication scheme; electroplating process; magnetic characteristics; micro axial-flux switched-reluctance motor; microelectromechanical system; micromachine design; muAFSRM; performance index evaluation; pole gaps; semiconductor manufacturing industry; three-dimensional finite element analysis; Costs; Degradation; Fabrication; Magnetic analysis; Manufacturing industries; Material properties; Microelectromechanical systems; Micromechanical devices; Micromotors; Performance analysis; axial flux; finite element analysis; micro-electromechanical system; performance index;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Power Electronics and Motion Control Conference, 2006. IPEMC 2006. CES/IEEE 5th International
  • Conference_Location
    Shanghai
  • Print_ISBN
    1-4244-0448-7
  • Type

    conf

  • DOI
    10.1109/IPEMC.2006.4778303
  • Filename
    4778303