Title :
An Ultra Wideband Solid State Rf Source
Author :
Aschoff, G.R. ; O´Bannon, B.J.
Author_Institution :
Rockwell International Corporation
Keywords :
Plasma applications; Plasma devices; Plasma materials processing; Plasma sheaths; Plasma sources; Power generation; Radio frequency; Solid state circuits; Switches; Ultra wideband technology;
Conference_Titel :
Plasma Science, 1991. IEEE Conference Record - Abstracts., 1991 IEEE International Conference on
Conference_Location :
Williamsburg, VA, USA
Print_ISBN :
0-7803-0147-1
DOI :
10.1109/PLASMA.1991.754116