High-throughput fabrication of sub-micron pillar arrays for free-solution DNA electrophoresis without E-beam lithography

A new technology approach for the design, fabrication and application of an integrated free-solution electrophoresis microsystem is presented. The technology approach, which utilizes the dual-photolithography provided from a stepper and a contact aligner, allows fast and flexible formation of sub-micron pillar array patterns on a silicon substrate. Combining with standard microfabrication technique and deep-reactive-ion-etching (DRIE), very high aspect-ratio sub-micron pillar arrays can be integrated in regular microfluidic system for free-solution DNA electrophoresis. DNA interaction with pillars inside the microsystem has been demonstrated, supporting the new technology approach a novel technique for Si-based free-solution electrophoresis microsystem fabrication