Title :
Submicron fabrication technology using electro-chemical effects and application to GHz-range unidirectional SAW transducers
Author :
Yamanouch, K. ; Odagawa, H. ; Meguro, T. ; Wagatsuma, Y. ; Yamamot, K.
Author_Institution :
Res. Inst. of Electr. Commun., Tohoku Univ., Sendai, Japan
Abstract :
The frequency ranges of mobile communication systems are now in GHz and is extending to 2~4 GHz. Moreover SAW devices require the frequency range of around 10 GHz. The submicron technology below 0.1 μm is required. In this paper, we propose a new lithography technique that can make below 0.05 μm electrode width. The electrodes are fabricated by using very thin anodic oxidation films as resists and wet or dry etching techniques. Also, new lithography technologies using electro-chemical effects are described in the fabrication process of the unidirectional SAW IDT with a different thickness and a material electrode using a single photolithography method. The results show the 0.075 μm width IDT with thickness about 0.03 μm on 128° Y-X LiNbO3. SAW experimental results show 17 GHz and 10 GHz-range SAW conventional interdigital transducers filters and the 1 GHz low loss filters with the insertion loss around 5 dB
Keywords :
acoustic microwave devices; electrodes; etching; interdigital transducers; lithium compounds; lithography; mobile communication; surface acoustic wave devices; surface acoustic wave filters; 0.03 mum; 0.05 mum; 0.075 mum; 0.1 mum; 1 GHz; 10 GHz; 17 GHz; 2 to 4 GHz; 5 dB; CrAl; GHz-range unidirectional SAW transducers; LiNbO3; Y-X LiNbO3; dry etching techniques; electro-chemical effects; electrode width; fabrication; insertion loss; interdigital transducers filters; lithography; low loss filters; mobile communication systems; photolithography; submicron fabrication technology; thin anodic oxidation films; unidirectional SAW IDT; wet etching techniques; Electrodes; Fabrication; Filters; Frequency; Lithography; Mobile communication; Oxidation; Resists; Surface acoustic wave devices; Surface acoustic waves;
Conference_Titel :
Frequency Control Symposium, 1994. 48th., Proceedings of the 1994 IEEE International
Conference_Location :
Boston, MA
Print_ISBN :
0-7803-1945-1
DOI :
10.1109/FREQ.1994.398329
