DocumentCode :
2669360
Title :
A test structure for reliability analysis of CMOS devices under DC and high frequency AC stress
Author :
Matsuda, T. ; Ichihashi, K. ; Iwata, H. ; Ohzone, T.
Author_Institution :
Dept. of Inf. Syst. Eng., Toyama Prefectural Univ., Toyama, Japan
fYear :
2015
fDate :
23-26 March 2015
Firstpage :
86
Lastpage :
89
Abstract :
A test structure for reliability analysis of MOSFETs in CMOS inverters under DC and high frequency AC stress has been presented. It has an input pulse generation block with a ring oscillator, monitor inverter blocks and Kelvin connected selector switches. Detailed I - V characteristics of MOSFETs in the monitor inverters were measured and the degradation by HCI and BTI in nMOS and pMOS devices were analyzed. The dominant degradation origins in nMOS and pMOS devices can be attributed to HCI and NBTI, respectively.
Keywords :
CMOS integrated circuits; MOSFET; hot carriers; integrated circuit reliability; integrated circuit testing; invertors; negative bias temperature instability; semiconductor device reliability; semiconductor device testing; CMOS inverters; DC stress; HCI; Kelvin connected selector switches; MOSFET; NBTI; alternative current mode; direct current mode; dominant degradation origins; high frequency AC stress; hot carrier injection; input pulse generation block; monitor inverter blocks; nMOS device; negative bias temperature instability; pMOS devices; reliability analysis; ring oscillator; test structure; Degradation; Logic gates; MOS devices; Reliability; Stress; Switching circuits;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microelectronic Test Structures (ICMTS), 2015 International Conference on
Conference_Location :
Tempe, AZ
ISSN :
1071-9032
Print_ISBN :
978-1-4799-8302-5
Type :
conf
DOI :
10.1109/ICMTS.2015.7106114
Filename :
7106114
Link To Document :
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