Title :
2010 IEEE international reliability physics symposium
Abstract :
The following topics are dealt with: pMOSFET, high electron mobility transistors, and heterojunction bipolar transistors; optoelectronics thin films; light emitting diodes; phase change memory devices; dielectric breakdown; magnetic tunnel junction; electromigration; package design; radiation-induced pulse noise; CMOS technology; circuit reliability; industrial fault injection platform; thyristor-based memory cell; flash memory; failure analysis; single metal dual dielectric gate stacks; nanoelectronics; power devices; interconnect electro- and stress-migration; interconnect low-k; high-k gate dielectric; stress-induced leakage current; transistor hot carriers; micromechanical devices; electrostatic discharge; charge trapping NAND flash devices; and other thin film devices.
Keywords :
electrostatic discharge; failure analysis; flash memories; heterojunction bipolar transistors; high electron mobility transistors; light emitting diodes; micromechanical devices; optoelectronic devices; reliability; thin film devices; charge trapping NAND flash devices; circuit reliability; dielectric breakdown; electromigration; electrostatic discharge; failure analysis; flash memory; heterojunction bipolar transistors; high electron mobility transistors; high-k gate dielectric; industrial fault injection platform; interconnect low-k; light emitting diodes; magnetic tunnel junction; micromechanical devices; nanoelectronics; optoelectronics thin films; pMOSFET; phase change memory devices; power devices; single metal dual dielectric gate stacks; stress-induced leakage current; thyristor-based memory cell; transistor hot carriers;
Conference_Titel :
Reliability Physics Symposium, 2009 IEEE International
Conference_Location :
Montreal, QC
Print_ISBN :
978-1-4244-2888-5
DOI :
10.1109/IRPS.2009.5173210