Title :
Fabrication of three-dimensional photonic crystals with midgap wavelength at 1.55 /spl mu/m
Author :
Minghao Qi ; Johnson, S.G. ; Joannopoulos, J.D. ; Smith, H.I.
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., Massachussetts Inst. of Technol., Cambridge, MA, USA
Abstract :
Seven-functional-layer 3D photonic crystals with midgap wavelength at 1.55 /spl mu/m were fabricated with a layer-by-layer approach. We employed e-beam lithography to align and define the pattern, reactive-ion-etching to transfer the pattern, and spin-on-dielectrics to planarize the surface. Four such cycles were sufficient to complete the fabrication.
Keywords :
electron beam lithography; optical fabrication; photonic crystals; sputter etching; 1.55 mum; electron-beam lithography; layer-by-layer approach; pattern transfer; photonic crystal fabrication; reactive-ion-etching; spin-on-dielectrics; surface planarization; three-dimensional photonic crystals; Computer science; Etching; Lithography; Materials science and technology; Microstructure; Optical device fabrication; Optical devices; Optical surface waves; Photonic crystals; Silicon;
Conference_Titel :
Quantum Electronics and Laser Science, 2003. QELS. Postconference Digest
Conference_Location :
Baltimore, MD, USA
Print_ISBN :
1-55752-749-0
DOI :
10.1109/QELS.2003.238455
