Title :
TDDB evaluations and modeling of very high-voltage (10kV) capacitors
Author_Institution :
Analog Technol. Dev., Texas Instrum., Inc., Dallas, TX, USA
Abstract :
Time-Dependent Dielectric Breakdown (TDDB) data for very thick (8 um) silica-based dielectrics is reported at relatively low fields (< 5 MV/cm) but at extremely high voltages (up to 4000 V). TDDB data was taken across a wide range of dielectric thicknesses ranging from 38 Aring to 8 mum (80,000 Aring). Consistent with the TDDB results generally reported for thin films, a thickness-independent effective dipole moment of ~13e Aring was concluded from the testing data. TDDB data is also presented for stacked dielectrics structures (Nitride/Silica) which tend to show a strong polarity dependence, depending on whether electron injection is into the nitride or oxide layer. While the time to failure is polarity dependent, the effective dipole moment is independent of polarity.
Keywords :
capacitors; dielectric thin films; electric breakdown; reliability; silicon compounds; SiO2; effective dipole moment; electron injection; nitride layer; oxide layer; polarity; reliability; silica-based dielectrics; size 38 A to 80000 A; stacked dielectrics structures; time-dependent dielectric breakdown; very high-voltage capacitors; voltage 10 kV; Breakdown voltage; Capacitors; Dielectric breakdown; Dielectric thin films; Electrodes; Packaging; Physics; Silicon compounds; Temperature; Testing; TDDB; Time-Dependent Dielectric Breakdown; effective dipole moment; nitride; silica; stacked dielectrics;
Conference_Titel :
Reliability Physics Symposium, 2009 IEEE International
Conference_Location :
Montreal, QC
Print_ISBN :
978-1-4244-2888-5
Electronic_ISBN :
1541-7026
DOI :
10.1109/IRPS.2009.5173292