Title :
Modeling Inductively Coupled Discharges For Plasma Processing
Author :
Mark J.Kushner ; Timothy J.Sommerer ; Seung J.Choi
Author_Institution :
University of Illinois
Keywords :
Argon; Chemicals; Electrons; Inductors; Kinetic theory; Magnets; Monte Carlo methods; Plasma materials processing; Plasma temperature; Semiconductor device modeling;
Conference_Titel :
Plasma Science,1992. IEEE Conference Record - Abstracts., 1992 IEEE International Conference on
Conference_Location :
Tampa, FL, USA
Print_ISBN :
0-7803-0716-X
DOI :
10.1109/PLASMA.1992.698003
