DocumentCode
2671511
Title
The mechanism of device damage during bump process for flip-chip package
Author
Lee, Jian-Hsing ; Shih, J.R. ; Tang, Chin-Hsin ; Niu, Pao-Kang ; Perng, D.-J. ; Lin, Y.-T. ; Su, David ; Wu, Kenneth
Author_Institution
Taiwan Semicond. Manuf. Co., Hsinchu, Taiwan
fYear
2009
fDate
26-30 April 2009
Firstpage
676
Lastpage
681
Abstract
Ring-type yield loss at wafer edge has been observed during flip-chip packaging process. The failure mechanism is attributed to the scrubber clean process step which generates a lot of charges. This in turn behaves like an electrostatic discharge (ESD) event and damages gate oxide of internal circuits. An equivalent circuit is proposed to analyze such a kind of ESD event and proves the importance of the parasitic capacitance of the interconnect metal.
Keywords
chip scale packaging; electrostatic discharge; equivalent circuits; failure analysis; flip-chip devices; device damage mechanism; electrostatic discharge event; equivalent circuit; failure mechanism; flip-chip package bump process; ring-type yield loss; scrubber clean process; Circuits; Electrostatic discharge; Failure analysis; Insulation; Manufacturing processes; Semiconductor device manufacture; Semiconductor device modeling; Semiconductor device packaging; Variable structure systems; Wafer scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium, 2009 IEEE International
Conference_Location
Montreal, QC
ISSN
1541-7026
Print_ISBN
978-1-4244-2888-5
Electronic_ISBN
1541-7026
Type
conf
DOI
10.1109/IRPS.2009.5173328
Filename
5173328
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