Title : 
The mechanism of device damage during bump process for flip-chip package
         
        
            Author : 
Lee, Jian-Hsing ; Shih, J.R. ; Tang, Chin-Hsin ; Niu, Pao-Kang ; Perng, D.-J. ; Lin, Y.-T. ; Su, David ; Wu, Kenneth
         
        
            Author_Institution : 
Taiwan Semicond. Manuf. Co., Hsinchu, Taiwan
         
        
        
        
        
        
            Abstract : 
Ring-type yield loss at wafer edge has been observed during flip-chip packaging process. The failure mechanism is attributed to the scrubber clean process step which generates a lot of charges. This in turn behaves like an electrostatic discharge (ESD) event and damages gate oxide of internal circuits. An equivalent circuit is proposed to analyze such a kind of ESD event and proves the importance of the parasitic capacitance of the interconnect metal.
         
        
            Keywords : 
chip scale packaging; electrostatic discharge; equivalent circuits; failure analysis; flip-chip devices; device damage mechanism; electrostatic discharge event; equivalent circuit; failure mechanism; flip-chip package bump process; ring-type yield loss; scrubber clean process; Circuits; Electrostatic discharge; Failure analysis; Insulation; Manufacturing processes; Semiconductor device manufacture; Semiconductor device modeling; Semiconductor device packaging; Variable structure systems; Wafer scale integration;
         
        
        
        
            Conference_Titel : 
Reliability Physics Symposium, 2009 IEEE International
         
        
            Conference_Location : 
Montreal, QC
         
        
        
            Print_ISBN : 
978-1-4244-2888-5
         
        
            Electronic_ISBN : 
1541-7026
         
        
        
            DOI : 
10.1109/IRPS.2009.5173328