DocumentCode :
2672461
Title :
The correlation between trap states and mechanical reliability of amorphous Si:H TFTs for flexible electronics
Author :
Lee, Moon Ho ; Chang, S.T. ; Weng, Sz-Chi ; Liu, Wen-Hao ; Chen, Kuan-Jen ; Ho, Kuan-Yu ; Liao, M.H. ; Huang, Jheng-Jia ; Hu, G.-R.
Author_Institution :
Inst. of Electro-Opt. Sci. & Technol., Nat. Taiwan Normal Univ., Taipei, Taiwan
fYear :
2009
fDate :
26-30 April 2009
Firstpage :
956
Lastpage :
959
Abstract :
The disordered bonds may generate a redistribution of trap states, resulting in unstable electrical characteristics such as threshold voltage, subthreshold swing, and mobility of carriers. The weak or broken bonds may contribute to the redistribution of trap states, and lead to unstable electrical characteristics of the a-Si:H TFTs on plastic substrates. We conclude that the DOS of an a-Si:H layer under mechanical strain is the fundamental reliability issue for the development of flexible electronics.
Keywords :
amorphous semiconductors; carrier mobility; flexible electronics; semiconductor device reliability; thin film transistors; Si:H; amorphous TFT; carrier mobility; correlation trapping; electrical characteristics; flexible electronics; mechanical reliability; threshold voltage; Amorphous materials; Capacitive sensors; Electric variables; Electron traps; Flexible electronics; Glass; Plasma temperature; Plastics; Substrates; Thin film transistors; a-Si:H; flexible; mechanical strain; trap state;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium, 2009 IEEE International
Conference_Location :
Montreal, QC
ISSN :
1541-7026
Print_ISBN :
978-1-4244-2888-5
Electronic_ISBN :
1541-7026
Type :
conf
DOI :
10.1109/IRPS.2009.5173388
Filename :
5173388
Link To Document :
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