DocumentCode :
2673694
Title :
Embedded thin film resistors, capacitors and inductors in flexible polyimide films
Author :
Lenihan, T. ; Schaper, L. ; Shi, Y. ; Morcan, G. ; Parkerson, J.
Author_Institution :
High Density Electron. Centre, Arkansas Univ., Fayetteville, AR, USA
fYear :
1996
fDate :
28-31 May 1996
Firstpage :
119
Lastpage :
124
Abstract :
The High Density Electronics Center (HiDEC) at the University of Arkansas is working with the Sheldahl MCM-L Consortium and Rensselaer Polytechnic Institute (RPI) to develop low-cost embedded resistors, capacitors, and inductors in flexible polyimide films under an ARPA contract. Embedding thin-film passive devices into polyimide layers as part of a Multichip Module (MCM) system is new. The design concept allows fabrication and testing of embedded passive devices before assembling them into an MCM-L substrate. Embedded passive devices are needed as an enhancement to present day MCM-L and MCM-D technologies. The ability to remove devices such as terminating resistors and decoupling capacitors from the surfaces of PCB boards and MCMs into a flexible film, at low cost, would be a break-through for MCM technology. The devices are made into a flexible MCM package using a 2 layer interconnect system called the Interconnected Mesh Power System (IMPS) developed and patented at the University of Arkansas. The IMPS interconnection topology incorporates fine line lithography and batch via generation to allow planar power and ground distribution, and dense signal interconnection, on only two metal layers. The materials being used are NiCr, TaN, and CrSi for the resistors and TaxOy and BaTiOx for the capacitors. Contacts, interconnecting signal lines, and power lines are made with Cu metallurgy. The devices are made on a 25 μm or 50 μm thick polyimide film and are encapsulated with the same polyimide
Keywords :
circuit layout; inductors; integrated circuit interconnections; multichip modules; polymer films; thin film capacitors; thin film circuits; thin film resistors; 2 layer interconnect system; 25 micron; 50 micron; BaTiO; BaTiOx; CrSi; Cu; Cu metallurgy; IMPS interconnection topology; Interconnected Mesh Power System; MCM-L substrate; NiCr; TaxOy; TaN; TaO; batch via generation; dense signal interconnection; fabrication; fine line lithography; flexible polyimide films; low-cost embedded passive components; multichip module; testing; thin film capacitors; thin film inductors; thin film resistors; thin-film passive devices; two metal layers; Capacitors; Contracts; Economic indicators; Fabrication; Multichip modules; Polyimides; Power system interconnection; Resistors; Thin film devices; Thin film inductors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Components and Technology Conference, 1996. Proceedings., 46th
Conference_Location :
Orlando, FL
ISSN :
0569-5503
Print_ISBN :
0-7803-3286-5
Type :
conf
DOI :
10.1109/ECTC.1996.517382
Filename :
517382
Link To Document :
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