Title :
VLSI yield optimization based on the sub-processing-element level redundancy
Author :
Zhao, Tianxu ; Hao, Yue ; Jiao, Yongchang
Author_Institution :
Inst. of Microelectron., Xidian Univ., Xi´´an, China
Abstract :
An optimal allocation model of the sub-processing-element (sub-PE) level redundancy is developed by using a genetic algorithm. The average defect density D and the support circuit parameter δ are considered in this allocation model to accurately analyze the element yield. Under the condition of the given area constraint, simulation results indicate that the number of the optimal redundant sub-circuits added to a PE and the PE´s yield are decrease for any given average defect density D as δ increase. Further, the number of the optimal redundant sub-circuits is increase, while the optimal yield of the PE is decrease for any given support circuit area parameter δ as D increases
Keywords :
VLSI; circuit optimisation; genetic algorithms; integrated circuit modelling; integrated circuit reliability; integrated circuit yield; redundancy; VLSI yield optimization; area constraint; average defect density; genetic algorithm; optimal allocation model; optimisation model; sub-processing-element level redundancy; Adders; Circuit simulation; Constraint optimization; Electronic mail; Genetic algorithms; Integrated circuit yield; Microelectronics; Redundancy; Registers; Very large scale integration;
Conference_Titel :
Defect and Fault Tolerance in VLSI Systems, 2000. Proceedings. IEEE International Symposium on
Conference_Location :
Yamanashi
Print_ISBN :
0-7695-0719-0
DOI :
10.1109/DFTVS.2000.886972