Extreme Ultraviolet Radiation from Z-pinch Plasmas for Next Generation Lithography

Author

Akiyama, H. ; Katsuki, S. ; Namihira, T. ; Sakugawa, T. ; Imamura, H.

Author_Institution

Grad. Sch. of Sci. & Technol., Kumamoto Univ., Kumamoto

fYear

2006

fDate

14-18 May 2006

Firstpage

356

Lastpage

359

Abstract

Development of the high power EUV (extreme ultraviolet) source has been expected as a light source for the next generation lithography. There are two kinds of EUV sources: the discharge produced plasma (DPP) and the laser produced plasma (LPP). The DPP method is considered to be promising in easiness of radiating the high power EUV and in the cheapness of constructing the EUV source. The Z- pinch plasmas driven by pulsed power have been used mainly in the DPP method. Here, the research results of the DPP method at Kumamoto University are summarized.

Keywords

Z pinch; discharges (electric); lithography; plasma production by laser; plasma sources; discharge-produced plasma; extreme ultraviolet radiation; laser-produced plasma; light source; lithography; z-pinch plasmas; Electron tubes; Fault location; Lithography; Magnetic field measurement; Plasma density; Plasma sources; Plasma temperature; Plasma waves; Ultraviolet sources; Voltage;

fLanguage

English

Publisher

ieee

Conference_Titel

Power Modulator Symposium, 2006. Conference Record of the 2006 Twenty-Seventh International

Conference_Location

Arlington, VA

Print_ISBN

1-4244-0018-X

Electronic_ISBN

1-4244-0019-8

Type

conf

DOI

10.1109/MODSYM.2006.365258

Filename

4216210