DocumentCode
2677893
Title
Parasitic effects on nanoassembly processes
Author
Wich, Thomas ; Stolle, Christian ; Edeler, Christoph ; Fatikow, Sergej
Author_Institution
Dept. of Comput. Sci., Univ. of Oldenburg, Oldenburg, Germany
fYear
2009
fDate
10-15 Oct. 2009
Firstpage
1389
Lastpage
1394
Abstract
This paper analyzes the disturbance sources acting on nano-assembly systems inside the scanning electron microscope, which complicate the automation of assembly processes in the scanning electron microscope. The influence of intrinsic sources, i.e. thermal drift, actuator offset and end effector vibrations due to actuator movements are examined and approaches are suggested. The electron-beam interaction with the assembly system has been identified as another disturbance source and its impact on automated assembly processes is qualified and quantified. Solutions for disturbance-resistant assembly processes are suggested.
Keywords
actuators; assembling; end effectors; industrial manipulators; scanning electron microscopes; actuator movements; actuator offset; disturbance sources; disturbance-resistant assembly processes; electron-beam interaction; end effector vibrations; intrinsic sources; nanoassembly processes; parasitic effects; scanning electron microscope; thermal drift; Actuators; Assembly systems; End effectors; Instruments; Intelligent robots; Mechanical sensors; Scanning electron microscopy; Tactile sensors; USA Councils; Vibrations;
fLanguage
English
Publisher
ieee
Conference_Titel
Intelligent Robots and Systems, 2009. IROS 2009. IEEE/RSJ International Conference on
Conference_Location
St. Louis, MO
Print_ISBN
978-1-4244-3803-7
Electronic_ISBN
978-1-4244-3804-4
Type
conf
DOI
10.1109/IROS.2009.5354016
Filename
5354016
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