• DocumentCode
    2677893
  • Title

    Parasitic effects on nanoassembly processes

  • Author

    Wich, Thomas ; Stolle, Christian ; Edeler, Christoph ; Fatikow, Sergej

  • Author_Institution
    Dept. of Comput. Sci., Univ. of Oldenburg, Oldenburg, Germany
  • fYear
    2009
  • fDate
    10-15 Oct. 2009
  • Firstpage
    1389
  • Lastpage
    1394
  • Abstract
    This paper analyzes the disturbance sources acting on nano-assembly systems inside the scanning electron microscope, which complicate the automation of assembly processes in the scanning electron microscope. The influence of intrinsic sources, i.e. thermal drift, actuator offset and end effector vibrations due to actuator movements are examined and approaches are suggested. The electron-beam interaction with the assembly system has been identified as another disturbance source and its impact on automated assembly processes is qualified and quantified. Solutions for disturbance-resistant assembly processes are suggested.
  • Keywords
    actuators; assembling; end effectors; industrial manipulators; scanning electron microscopes; actuator movements; actuator offset; disturbance sources; disturbance-resistant assembly processes; electron-beam interaction; end effector vibrations; intrinsic sources; nanoassembly processes; parasitic effects; scanning electron microscope; thermal drift; Actuators; Assembly systems; End effectors; Instruments; Intelligent robots; Mechanical sensors; Scanning electron microscopy; Tactile sensors; USA Councils; Vibrations;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Intelligent Robots and Systems, 2009. IROS 2009. IEEE/RSJ International Conference on
  • Conference_Location
    St. Louis, MO
  • Print_ISBN
    978-1-4244-3803-7
  • Electronic_ISBN
    978-1-4244-3804-4
  • Type

    conf

  • DOI
    10.1109/IROS.2009.5354016
  • Filename
    5354016