DocumentCode :
267877
Title :
High aspect ratio, Large area silicon-based gratings for X-ray phase contrast imaging
Author :
Baborowski, J. ; Revol, V. ; Kottler, C. ; Kaufmann, Richard ; Niedermann, P. ; Cardot, F. ; Dommann, A. ; Neels, A. ; Despont, Michel
Author_Institution :
CSEM SA, Neuchatel, Switzerland
fYear :
2014
fDate :
26-30 Jan. 2014
Firstpage :
490
Lastpage :
493
Abstract :
This paper reports on the latest developments in the manufacturing of high aspect ratio silicon-based gratings used for X-ray phase contrast imaging (XPCI). Grating-based XPCI provides, in one measurement, unique information about the absorption coefficient, the index of refraction and the microscopic structure of a sample at hard X-ray frequencies. For this reason, XPCI can potentially overcome the limitations of classical absorption-based radiography, notably for weakly absorbing materials. New micro-fabrication processes were developed to manufacture full set of large area and high aspect ratio X-ray gratings with few defects. The complementarity of XPCI with conventional absorption-based radiography was experimentally demonstrated.
Keywords :
X-ray imaging; absorption coefficients; diffraction gratings; elemental semiconductors; microfabrication; microsensors; radiography; refractive index; silicon; Si; X-ray frequency; X-ray phase contrast imaging; XPCI; absorbing materials; absorption coefficient; absorption-based radiography; high aspect ratio; microfabrication process; refraction index; sample microscopic structure; silicon-based gratings; Absorption; Gold; Gratings; Imaging; Silicon; X-ray imaging;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Micro Electro Mechanical Systems (MEMS), 2014 IEEE 27th International Conference on
Conference_Location :
San Francisco, CA
Type :
conf
DOI :
10.1109/MEMSYS.2014.6765684
Filename :
6765684
Link To Document :
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