Nanofiber forests with high infrared absorptance

Author

Mao, H.Y. ; Lei, Changhui ; Chen, Y.J. ; Chen, Z.J. ; Ou, Weixin ; Wu, W.G. ; Ming, A.J. ; Chen, D.P.

Author_Institution

Key Lab. of Microelectron. Devices & Integrated Technol., Inst. of Microelectron., Beijing, China

fYear

2014

fDate

26-30 Jan. 2014

Firstpage

644

Lastpage

647

Abstract

In this work, nanofiber forests with high infrared (IR) absorptance are reported. In wavelength range from 1.5 to 5 μm, the absorptance of the nanofiber forests reaches a minimum of 96%, which is much higher than that of Si₃N₄-based IR absorbers and the polymer coatings from which the nanofibers are obtained. Such nanofiber forests are fabricated by using a plasma-stripping-of-polymer technique, which is fast, high-yield and applicable to a wide range of polymers. Moreover, the technique is highly compatible with micro-fabrication. As a result, the nanofiber forests can be introduced into MEMS (Micro-Electro-Mechanical systems) IR devices, and it is expected that the performance of such devices can be improved.

Keywords

infrared spectra; light absorption; micro-optics; microfabrication; micromechanical devices; nanophotonics; plasma materials processing; polymers; silicon compounds; MEMS; Si₃N₄; high infrared absorptance fiber; microelectromechanical systems; microfabrication process; nanofiber forests; plasma stripping-of-polymer technique; polymer coatings; wavelength 1.5 mum to 5 mum; Fabrication; Micromechanical devices; Nanoscale devices; Plasmas; Polymers; Resists; Substrates;

fLanguage

English

Publisher

ieee

Conference_Titel

Micro Electro Mechanical Systems (MEMS), 2014 IEEE 27th International Conference on

Conference_Location

San Francisco, CA

Type

conf

DOI

10.1109/MEMSYS.2014.6765723

Filename

6765723