DocumentCode

2679940

Title

Influence of carrier gas on cu nucleation, film properties and MOCVD reaction kinetics

Author

Röber, J. ; Riedel, S. ; Schulz, S.E. ; Gebner, T.

Author_Institution

TU Chemmitz-Zwickau

fYear

1997

fDate

16-19 March 1997

Firstpage

25

Lastpage

26

Keywords

Additives; Argon; Conductivity; Copper; Hydrogen; Kinetic theory; MOCVD; Metallization; Substrates; Temperature;

fLanguage

English

Publisher

ieee

Conference_Titel

Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop

Conference_Location

Villard de Lans, France

ISSN

1266-0167

Type

conf

DOI

10.1109/MAM.1998.887499

Filename

887499