SiOF and SiO₂ deposition in a HDP reactor: tool characterisation and film analysis

Author

den Boer, D.J. ; Fukuda, H. ; van der Hilst, J.B.C. ; Kalkman, A.J. ; Janssen, G.C.A.M. ; Radelaar, S.

Author_Institution

Dimes, Delft University

fYear

1997

fDate

16-19 March 1997

Firstpage

Lastpage

Keywords

Aluminum; Conductors; Dielectric materials; Filling; Inductors; Inorganic materials; Metallization; Plasma applications; Plasma density; Sputtering;

fLanguage

English

Publisher

ieee

Conference_Titel

Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop

Conference_Location

Villard de Lans, France

ISSN

1266-0167

Type

DOI

10.1109/MAM.1998.887516

Filename

887516

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