مرکز منطقه ای اطلاع رساني علوم و فناوري

DocumentCode :

2680202

Title :

Cleaning after silicon oxide CMP

Author :

Tardif, F. ; Mansart, I. ; Lardin, T. ; Demolliens, O. ; Fayolle, M. ; Gobile, Y. ; Palleau, J. ; Torres, J.

Author_Institution :

GRESSI-LETI-CEA/G

fYear :

1997

fDate :

16-19 March 1997

Firstpage :

Lastpage :

Keywords :

Chemical technology; Cleaning; Contamination; Dielectrics; Hafnium; Inorganic materials; Metallization; Planarization; Silicon; Slurries;

fLanguage :

English

Publisher :

ieee

Conference_Titel :

Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop

Conference_Location :

Villard de Lans, France

ISSN :

1266-0167

Type :

conf

DOI :

10.1109/MAM.1998.887517

Filename :

887517

Link To Document :