Title :
Sub-half micron metallization using high pressure Al
Author_Institution :
Electrotech, Thornbury Laboratories
Keywords :
Artificial intelligence; Dielectrics; Electromigration; Filling; Indium phosphide; Inorganic materials; Laboratories; Metallization; Plugs; Temperature;
Conference_Titel :
Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop
Conference_Location :
Villard de Lans, France
DOI :
10.1109/MAM.1998.887518
