• DocumentCode
    2680278
  • Title

    WNx/W as a low-resistance gate material and local interconnect

  • Author

    Galewski, C.J. ; Gadgil, P.N. ; Matthysse, L.D. ; Sans, C.A.

  • Author_Institution
    GENUS
  • fYear
    1997
  • fDate
    16-19 March 1997
  • Firstpage
    88
  • Lastpage
    90
  • Keywords
    Amorphous materials; Annealing; Conductivity; Crystallization; Inorganic materials; Metallization; Plasma chemistry; Plasma temperature; Sputtering; X-ray scattering;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop
  • Conference_Location
    Villard de Lans, France
  • ISSN
    1266-0167
  • Type

    conf

  • DOI
    10.1109/MAM.1998.887522
  • Filename
    887522
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2680278