DocumentCode :
2680297
Title :
Planar aluminiurn multilevel interconnection formed by electrochemical anodizing technique
Author :
Surganov, V. ; Mozalev, A.
Author_Institution :
University of Informatics and Radioelectronics
fYear :
1997
fDate :
16-19 March 1997
Firstpage :
91
Lastpage :
92
Keywords :
Aluminum; Conducting materials; Costs; Dielectric materials; Manufacturing processes; Metallization; Planarization; Plasma applications; Plasma chemistry; Plasma materials processing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop
Conference_Location :
Villard de Lans, France
ISSN :
1266-0167
Type :
conf
DOI :
10.1109/MAM.1998.887523
Filename :
887523
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2680297
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