• DocumentCode
    2680325
  • Title

    Selective TiSi2 by CVD, one step further

  • Author

    Maury, D. ; Regolini, J.L.

  • Author_Institution
    France Telecom - CNET Grenoble
  • fYear
    1997
  • fDate
    16-19 March 1997
  • Firstpage
    105
  • Lastpage
    107
  • Keywords
    Chemical technology; Circuits; Contact resistance; Inorganic materials; Metallization; Sheet materials; Silicides; Substrates; Temperature; Ultra large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop
  • Conference_Location
    Villard de Lans, France
  • ISSN
    1266-0167
  • Type

    conf

  • DOI
    10.1109/MAM.1998.887527
  • Filename
    887527
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2680325