• DocumentCode
    2680594
  • Title

    Reactive ion etching of metal stack consisting of an aluminium alloy, WGEx barrier and Ti adhesion layer

  • Author

    Sabouret, E. ; Verhoeven, P.F.M. ; Jongste, J.F. ; Janssen, G.C.A.M. ; Radelaar, S.

  • Author_Institution
    Delft Institute of Microelectronies and Submicron Technology
  • fYear
    1997
  • fDate
    16-19 March 1997
  • Firstpage
    138
  • Lastpage
    139
  • Keywords
    Aluminum alloys; Anisotropic magnetoresistance; Etching; Gases; Inorganic materials; Metallization; Plasma applications; Plasma chemistry; Radio frequency; Space technology;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop
  • Conference_Location
    Villard de Lans, France
  • ISSN
    1266-0167
  • Type

    conf

  • DOI
    10.1109/MAM.1998.887547
  • Filename
    887547
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2680594