DocumentCode :
2680625
Title :
Deposition of thin TiN films by low-power reactive magnetron sputtering
Author :
Mikhal´chuk, P.V. ; Orlikovsky, A.A. ; Vasiliev, A.G. ; Lebedev, O.I. ; Zakharov, D.N.
Author_Institution :
Russian Academy of Sciences
fYear :
1997
fDate :
16-19 March 1997
Firstpage :
143
Lastpage :
145
Keywords :
Conductivity; Magnetic materials; Magnetic multilayers; Nitrogen; Physics; Sputtering; Substrates; Temperature measurement; Tin; Titanium;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop
Conference_Location :
Villard de Lans, France
ISSN :
1266-0167
Type :
conf
DOI :
10.1109/MAM.1998.887549
Filename :
887549
Link To Document :
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