• DocumentCode
    268074
  • Title

    Stable pull-in electrodes for narrow gap actuation

  • Author

    Ng, Eldwin Jiaqiang ; Yushi Yang ; Hong, Vu A. ; Ahn, Chong H. ; Christensen, David L. ; Gibson, Brian A. ; Qalandar, K.R. ; Turner, K.L. ; Kenny, Thomas W.

  • Author_Institution
    Stanford Univ., Stanford, CA, USA
  • fYear
    2014
  • fDate
    26-30 Jan. 2014
  • Firstpage
    1281
  • Lastpage
    1284
  • Abstract
    This paper reports the use of movable electrodes that can be electrostatically pulled in to achieve narrow gaps beyond lithography / etch capabilities. Width-extensional resonators with frequencies of 50 MHz and quality factors of 150k are demonstrated with such movable electrodes to have a significantly lower motional impedances when pullin occurs. Sub-ppm stability over 105 pull-in/pull-out cycles is measured using temperature-compensated resonators within the epi-seal epitaxial polysilicon encapsulation process. The pull-in phenomena is reversible, but can be made permanent by electrically welding the pulled-in electrode to a stop.
  • Keywords
    electric welding; encapsulation; microactuators; microelectrodes; micromechanical resonators; sputter etching; epi seal epitaxial polysilicon encapsulation process; frequency 50 MHz; motional impedances; movable electrodes; narrow gap actuation; pulled in electrode; stable pull in electrodes; subppm stability; temperature compensated resonators; width extensional resonators; Electrodes; Epitaxial growth; Impedance; Resonant frequency; Silicon; Thermal stability; Welding;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems (MEMS), 2014 IEEE 27th International Conference on
  • Conference_Location
    San Francisco, CA
  • Type

    conf

  • DOI
    10.1109/MEMSYS.2014.6765883
  • Filename
    6765883