DocumentCode :
2680804
Title :
Characterization of thin TiSi2 films by spectroscopic ellipsometry and thermal wave analysis
Author :
Kai, Shen ; Kasko, I. ; Ryssel, H.
Author_Institution :
Universitaet Erlangen-Nuernberg
fYear :
1997
fDate :
16-19 March 1997
Firstpage :
169
Lastpage :
172
Keywords :
Atomic force microscopy; Electrical resistance measurement; Ellipsometry; Inorganic materials; Optical films; Optical materials; Sheet materials; Silicides; Spectroscopy; Thickness measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop
Conference_Location :
Villard de Lans, France
ISSN :
1266-0167
Type :
conf
DOI :
10.1109/MAM.1998.887561
Filename :
887561
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2680804
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