Title :
Characterization of thin TiSi2 films by spectroscopic ellipsometry and thermal wave analysis
Author :
Kai, Shen ; Kasko, I. ; Ryssel, H.
Author_Institution :
Universitaet Erlangen-Nuernberg
Keywords :
Atomic force microscopy; Electrical resistance measurement; Ellipsometry; Inorganic materials; Optical films; Optical materials; Sheet materials; Silicides; Spectroscopy; Thickness measurement;
Conference_Titel :
Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop
Conference_Location :
Villard de Lans, France
DOI :
10.1109/MAM.1998.887561