DocumentCode :
2680851
Title :
Investigation of chemical interactions on the interface W/Si
Author :
Pluscheva, S.V. ; Shabeinikov, L.G. ; Malikov, I.V. ; Andreeva, A.V.
Author_Institution :
Russian Academy of Sciences
fYear :
1997
fDate :
16-19 March 1997
Firstpage :
178
Lastpage :
179
Keywords :
Annealing; Chemical vapor deposition; Hydrogen; Materials science and technology; Plasma measurements; Plasma temperature; Plasma x-ray sources; Semiconductor films; Silicides; Sputtering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop
Conference_Location :
Villard de Lans, France
ISSN :
1266-0167
Type :
conf
DOI :
10.1109/MAM.1998.887564
Filename :
887564
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2680851
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