DocumentCode :
2680976
Title :
Solid state reactions and barrier properties of the thin films Ti-W on the silicon
Author :
Makogon, Yu.N. ; Maximovich, L.P. ; Sidorenko, S.I.
Author_Institution :
National Technic Univercity of Ukraine "Kyiv Polytechnical Institute"
fYear :
1997
fDate :
16-19 March 1997
Firstpage :
198
Lastpage :
198
Keywords :
Aluminum; Annealing; Heat treatment; Physics; Semiconductor thin films; Silicon; Solid state circuits; Sputtering; Temperature distribution; Vacuum technology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop
Conference_Location :
Villard de Lans, France
ISSN :
1266-0167
Type :
conf
DOI :
10.1109/MAM.1998.887573
Filename :
887573
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2680976
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