DocumentCode

2681100

Title

TaSiN barrier layer for the oxygen diffusion

Author

Hara, T. ; Tanaka, M. ; Kobayashi, T. ; Kitamura, T.

Author_Institution

Hosei University

fYear

1997

fDate

16-19 March 1997

Firstpage

213

Lastpage

215

Keywords

Annealing; Capacitors; Conductivity; Contact resistance; Electrodes; Leakage current; Oxidation; Oxygen; Radio frequency; Sputtering;

fLanguage

English

Publisher

ieee

Conference_Titel

Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop

Conference_Location

Villard de Lans, France

ISSN

1266-0167

Type

conf

DOI

10.1109/MAM.1998.887581

Filename

887581