DocumentCode
268193
Title
Benefit of Selective Emitters for p-Type Silicon Solar Cells With Passivated Surfaces
Author
Jäger, Ulrich ; Mack, S. ; Wufka, C. ; Wolf, Alon ; Biro, Daniel ; Preu, Ralf
Author_Institution
Fraunhofer Inst. for Solar Energy Syst., Freiburg, Germany
Volume
3
Issue
2
fYear
2013
fDate
Apr-13
Firstpage
621
Lastpage
627
Abstract
We compare homogeneous and selective emitters on monocrystalline silicon solar cells with passivated surfaces and present an analysis of the saturation current densities influencing the open-circuit voltage VOC and the fill factor FF . The cells´ surfaces are passivated by a thin thermal oxide. Selective emitters are fabricated by laser doping from phosphosilicate glass. On both Czochralski-grown silicon (Cz-Si) as well as float zone silicon (FZ-Si), we find higher conversion efficiencies for the cells featuring a selective emitter. An efficiency up to 20.0% is reported on FZ-Si with an area of 148.4 cm2 . For the selective emitter cells, 8 mV higher open-circuit voltages are found compared with the baseline. A saturation current analysis reveals that these cells exhibit a lower diode saturation current density of ideality 2 (J02), as well as improved shielding of the minorities in the emitter from the front contact. The selective emitter cells show a minor loss in short-circuit current density JSC of 0.5 %rel due to the presence of highly doped, illuminated areas. Front contact quality of the cells featuring a selective emitter is found to be superior compared with the cells with a homogeneously doped emitter.
Keywords
crystal growth from melt; current density; elemental semiconductors; passivation; semiconductor doping; short-circuit currents; silicon; solar cells; zone melting; Czochralski-grown silicon; Si; conversion efficiency; diode saturation current density; doped illuminated areas; fill factor; float zone silicon; front contact quality; homogeneous emitters; laser doping; monocrystalline silicon solar cells; open-circuit voltage; p-type silicon solar cells; passivated surface; phosphosilicate glass; selective emitter cells; shielding; short-circuit current density; thin thermal oxide; Current density; Doping; Electrical resistance measurement; Loss measurement; Photovoltaic cells; Resistance; Silicon; Laser doping; passivated emitter and rear cell; selective emitter; silicon solar cell;
fLanguage
English
Journal_Title
Photovoltaics, IEEE Journal of
Publisher
ieee
ISSN
2156-3381
Type
jour
DOI
10.1109/JPHOTOV.2012.2230685
Filename
6389697
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