Title :
Self-organized iron silicide nano dots on silicon [001] substrate
Author :
Chou, L.J. ; Chuen, Y.L.
Author_Institution :
Dept. of Mater. Sci. & Eng., Nat. Tsing Hua Univ., Hsinchu, Taiwan
Abstract :
This paper studies the self-organized iron silicide nano dots on silicon [001] substrate. In the experiment, self-aligned (1D) iron disilicide quantum dots have been successfully grown by a UHV electron gun evaporation system with vacuum level better that 10-9 torr, using either SixGe1-x or strained Si as a substrate. JEOL 2010 and 4000EX transmission electron microscopes, operating at 200 and 400 KeV, were used to study the microstructures.
Keywords :
crystal microstructure; iron compounds; nanostructured materials; quantum dots; self-assembly; transmission electron microscopy; vacuum deposition; 200 keV; 400 keV; 4000EX transmission electron microscopes; FeSi2-Si; JEOL 2010 transmission electron microscopes; Si; UHV electron gun evaporation system; microstructures; self-organized iron silicide nanodots; selfaligned (1D) iron disilicide quantum dots; silicon [001] substrate; Electrons; Elementary particle vacuum; Iron; Materials science and technology; Optical devices; Quantum dots; Silicides; Substrates; Temperature; US Department of Transportation;
Conference_Titel :
Lasers and Electro-Optics, 2003. CLEO/Pacific Rim 2003. The 5th Pacific Rim Conference on
Print_ISBN :
0-7803-7766-4
DOI :
10.1109/CLEOPR.2003.1277100
