Title :
Double layers in a plasma with negative ions
Author :
Merlino, Robert L. ; Loomis, J.J.
Abstract :
Summary form only given. The formation of double layers in a plasma containing positive ions, negative ions, and electrons is being investigated. This work is done in a triple plasma device with two independent plasma discharge sources operating in argon at pressure on the order of 10-5-10-4 torr. The double layers are produced by applying a potential difference between the two independently produced plasmas. In Ar+ /e- plasmas, the double layers are characterized by potential differences eV/kTe~10-30. The negative ion plasmas are produced by adding small amounts of SF6 gas into the argon ion/electron plasma. The plasma electrons readily attach to the SF6 molecules to form a plasma with Ar+, e-, and SF6- ions, although other negative ion species as well as additional positive ions may also be present. In one typical case investigated extensively, the addition of SF6 results in the formation of a potential structure in which the overall potential drop present in the pure Ar+/e- double layer is distributed over two smaller double layers over a more extended axial region
Keywords :
electron attachment; negative ions; plasma collision processes; plasma sheaths; 10-5 to 10-4 torr; Ar; Ar+; SF6 gas; SF6-Ar; double layers; electron attachment; extended axial region; negative ions; plasma; plasma electrons; positive ions; potential difference; triple plasma device; two independent plasma discharge sources;
Conference_Titel :
Plasma Science, 1990. IEEE Conference Record - Abstracts., 1990 IEEE International Conference on
Conference_Location :
Oakland, CA, USA
DOI :
10.1109/PLASMA.1990.110611