DocumentCode
2683978
Title
New developments in photo-aligning technologies: physics and applications
Author
Chigrinov, V.G. ; Kozenkov, V.M. ; Kwok, H.S. ; Takada, H. ; Takatsu, L.
Author_Institution
Hong Kong Univ. of Sci. & Technol., Kowloon, China
Volume
2
fYear
2003
fDate
15-19 Dec. 2003
Abstract
A review on novel photonic-aligning technology, the physics and its application in LC devices is briefly discussed. An introduction to the physical mechanisms of the photo-aligning and photo-patterning technology is given. The characterization of LC-surface interaction, such as pretilt angle and azimuthal anchoring energy is also discussed. Photo-aligning of ferroelectric LC has been described.
Keywords
liquid crystal devices; molecular orientation; LC devices; LC-surface interaction; azimuthal anchoring energy; ferroelectric LC; photo-patterning; photonic-aligning technology; pretilt angle; review; Chemical technology; Ferroelectric materials; Ink; Low voltage; Optical polarization; Physics; Polyimides; Polymer films; Research and development; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2003. CLEO/Pacific Rim 2003. The 5th Pacific Rim Conference on
Print_ISBN
0-7803-7766-4
Type
conf
DOI
10.1109/CLEOPR.2003.1277189
Filename
1277189
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