DocumentCode :
2684669
Title :
Low energy metal ion beam source
Author :
Godechot, X. ; Brown, I.G.
fYear :
1990
fDate :
21-23 May 1990
Firstpage :
159
Lastpage :
160
Abstract :
Summary form only given. A high-current metal ion source has been developed in which a metal vapor vacuum arc is used as the plasma discharge mechanism, by means of which high-current beams of a wide range of multiply charged metal ions can be produced. Operating the source in a mode suitable for very-low-energy beam formation, in the approximate range of 100 eV to 2 keV, which might be useful for ion-beam-assisted deposition and other plasma processing applications, has been investigated. The beam formation electrodes (extractor grids) were reconfigured to work in an almost-symmetric accelerating-decelerating potential arrangement. In preliminary tests, an accelerating voltage that was limited to just 4 kV was used, and a titanium ion beam with a current of up to 100 mA at 1.5-kV net beam voltage was produced. It is anticipated that low-energy metal ion beams with current up to the 1-A level should be obtainable with an optimized grid spacing and an accelerating voltage of 10-20 kV
Keywords :
ion beams; ion sources; metals; 1 A; 1.5 kV; 10 to 20 kV; 100 eV to 2 keV; 100 mA; 4 kV; accelerating voltage; almost-symmetric accelerating-decelerating potential arrangement; high-current; low energy metal ion beam source; metal vapor vacuum arc; multiply charged metal ions; optimized grid spacing; plasma discharge mechanism; very-low-energy beam formation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1990. IEEE Conference Record - Abstracts., 1990 IEEE International Conference on
Conference_Location :
Oakland, CA, USA
Type :
conf
DOI :
10.1109/PLASMA.1990.110708
Filename :
5725980
Link To Document :
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