Title :
Characteristics of an electron cyclotron resonance multicusp plasma source
Author :
Tsai, C.C. ; Berry, L.A. ; Haselton, H.H. ; Schechter, D.E.
Abstract :
Summary form only given. An electron cyclotron resonance (ECR) multicusp plasma source has been developed by using two ECR plasma production layers and multicusp plasma confinement. The effect of the length of the multicusp plasma chamber on the radial plasma uniformity has been investigated. It was found that the plasma chamber length can affect the initiation of discharges. The plasma source can be applied to thin film plasma processing
Keywords :
plasma confinement; plasma production; ECR plasma production layers; discharges; electron cyclotron resonance multicusp plasma source; plasma chamber; plasma confinement; radial plasma uniformity; thin film plasma processing;
Conference_Titel :
Plasma Science, 1990. IEEE Conference Record - Abstracts., 1990 IEEE International Conference on
Conference_Location :
Oakland, CA, USA
DOI :
10.1109/PLASMA.1990.110709
