DocumentCode :
2684707
Title :
A microwave generated plasma for ion implantation studies
Author :
Keebler ; Roth
fYear :
1990
fDate :
21-23 May 1990
Firstpage :
161
Abstract :
Summary form only given. Industrially acceptable methods of plasma ion implantation not only require an efficient means of switching the negative high-voltage pulses, but also require an energy efficient plasma generation system. In order to achieve this, a nonmagnetized microwave generated plasma was designed and is being built. The power source is a model PPS-2.5 AS 2500-W, 2.45-GHz Varian (Eimac) microwave power pack with a WR-340 waveguide port. The forward and reflected power is measured with a model EW3-DPM3S Varian power meter. A model EW3-HH Varian HH tuner is included for impedance matching. A model GS315 Gerling RMS step transition, which steps a WR-340 (S-band) waveguide to a WR-284 waveguide, is included. A standard EH tuner is used for most of the matching since the plasma is a changing load. The cavity was designed so that several TE modes (other than the dominant mode) will be set up in the resonator to give a quasi-uniform field distribution, so that the plasma can have an approximately uniform number density
Keywords :
ion implantation; plasma applications; 2.45 GHz; 2500 W; PPS-2.5 AS; Varian HH tuner; WR-284 waveguide; WR-340 S-band waveguide; changing load; impedance matching; ion implantation; matching; microwave generated plasma; microwave power pack; model EW3-DPM3S Varian power meter; model GS315 Gerling RMS step transition; negative high-voltage pulses; nonmagnetized microwave generated plasma; number density; plasma generation system; power source; quasi-uniform field distribution; reflected power;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1990. IEEE Conference Record - Abstracts., 1990 IEEE International Conference on
Conference_Location :
Oakland, CA, USA
Type :
conf
DOI :
10.1109/PLASMA.1990.110712
Filename :
5725984
Link To Document :
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