Title :
Optical-gradient type of antireflective coatings for sub-70 nm optical lithography applications
Author :
Chen, H.L. ; Fan, Wonder ; Wang, T.J. ; Ko, F.H. ; Zhai, R.S. ; Hsu, C.K. ; Chuang, T.J.
Author_Institution :
Nat. Nano Device Lab., Hsinchu, Taiwan
Abstract :
We demonstrate an optical-gradient bottom antireflective coating film, which is prepared by a silicon nitride film treated with oxygen plasma. Results indicate that the optical-gradient type film is suitable for sub-70 nm optical lithography applications.
Keywords :
antireflection coatings; optical films; oxidation; plasma materials processing; silicon compounds; surface treatment; ultraviolet lithography; O2; SiN; bottom antireflective coatings; optical-gradient type film; oxygen plasma treatment; silicon nitride film; sub-70 nm optical lithography; Coatings; Electrooptic devices; Integrated circuit technology; Lithography; Optical films; Plasma applications; Reflectivity; Semiconductor films; Silicon; Substrates;
Conference_Titel :
Lasers and Electro-Optics, 2003. CLEO/Pacific Rim 2003. The 5th Pacific Rim Conference on
Print_ISBN :
0-7803-7766-4
DOI :
10.1109/CLEOPR.2003.1277241
