• DocumentCode
    2684870
  • Title

    Optical-gradient type of antireflective coatings for sub-70 nm optical lithography applications

  • Author

    Chen, H.L. ; Fan, Wonder ; Wang, T.J. ; Ko, F.H. ; Zhai, R.S. ; Hsu, C.K. ; Chuang, T.J.

  • Author_Institution
    Nat. Nano Device Lab., Hsinchu, Taiwan
  • Volume
    2
  • fYear
    2003
  • fDate
    15-19 Dec. 2003
  • Abstract
    We demonstrate an optical-gradient bottom antireflective coating film, which is prepared by a silicon nitride film treated with oxygen plasma. Results indicate that the optical-gradient type film is suitable for sub-70 nm optical lithography applications.
  • Keywords
    antireflection coatings; optical films; oxidation; plasma materials processing; silicon compounds; surface treatment; ultraviolet lithography; O2; SiN; bottom antireflective coatings; optical-gradient type film; oxygen plasma treatment; silicon nitride film; sub-70 nm optical lithography; Coatings; Electrooptic devices; Integrated circuit technology; Lithography; Optical films; Plasma applications; Reflectivity; Semiconductor films; Silicon; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics, 2003. CLEO/Pacific Rim 2003. The 5th Pacific Rim Conference on
  • Print_ISBN
    0-7803-7766-4
  • Type

    conf

  • DOI
    10.1109/CLEOPR.2003.1277241
  • Filename
    1277241
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2684870